Methods and systems for improved dosing of a chemical...

C - Chemistry – Metallurgy – 02 – F

Patent

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C02F 1/76 (2006.01)

Patent

CA 2534040

The invention is directed to methods, apparatuses, and systems for treatment of a liquid flow comprising addition of a chemical treatment at at least two locations (16, 24) along a side stream of a main flow (4) of said liquid, in which the dosing by such additions is sufficient to treat the entire main flow upon return of the side stream to the main flow. Algorithms are utilized to control the additions at the locations of addition of chemical treatments. In a typical embodiment, one chemical addition is principally proportional to the flow rate of the liquid flow, and the other chemical addition is principally adjusted based on signals from a primary measuring device that measures a parameter in the flow after one or both chemical additions. The addition of chlorine dioxide as the chemical treatment, to disinfect wastewater, is discussed.

L'invention décrit des procédés, des appareils et des systèmes de traitement d'un écoulement liquide. Ces procédés consistent à injecter un traitement chimique à deux endroits (16, 24) au moins le long de l'affluent du flux principal (4) dudit liquide, le dosage de ces additions suffisant à traiter la totalité du flux principal après retour de l'affluent vers le flux principal. Des algorithmes sont utilisés pour réguler les additions des traitements chimiques aux endroits prévus. Dans un mode de réalisation représentatif, la première addition d'un produit chimique est principalement proportionnelle au débit de l'écoulement liquide, l'autre addition de produit chimique étant principalement ajustée sur la base des signaux provenant du dispositif de mesure qui mesure un paramètre de l'écoulement après une ou deux additions. L'invention décrit également l'addition de dioxyde de chlore comme traitement chimique pour désinfecter les eaux usées.

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