C - Chemistry – Metallurgy – 23 – C
Patent
C - Chemistry, Metallurgy
23
C
C23C 16/12 (2006.01) C23C 16/40 (2006.01)
Patent
CA 2562299
The invention concerns a method comprising the following steps: placing the substrate (12) in a vacuum chamber (14), forming a gas by evaporating a constituent which is liquid at atmospheric pressure and at room temperature and introducing a gas in the chamber (14). The gas is decomposed and a complementary gas is introduced into the chamber (14) designed to react with the decomposed gas, to form at least one thin film on the substrate (12). The invention also concerns a method for forming a coloured film and a related device (10) capable of implementing the inventive method.
Le procédé comprend les étapes suivantes : on place le substrat (12) dans une enceinte (14) sous vide, on forme un gaz par évaporation d'un composant qui est liquide à pression atmosphérique et à température ambiante et on introduit un gaz dans l'enceinte (14). On décompose le gaz et on introduit dans l'enceinte (14) un gaz de complément destiné à réagir avec le gaz décomposé, pour former au moins une couche mince sur le substrat (12). L'invention concerne également un procédé de formation d'un film coloré et un dispositif (10) associé pouvant mettre en oeuvre le procédé selon l'invention.
Durand Jean
Lauvray Francois
Richardt Isabelle
Neyco
Robic
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