Methods for fabricating isolated micro- and nano- structures...

H - Electricity – 01 – L

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H01L 21/02 (2006.01)

Patent

CA 2549341

The presently disclosed subject matter describes the use of fluorinated elastomer-based materials, in particular perfluoropolyether (PFPE)-based materials, in high-resolution soft or imprint lithographic applications, such as micro- and nanoscale replica molding, and the first nano-contact molding of organic materials to generate high fidelity features using an elastomeric mold. Accordingly, the presently disclosed subject matter describes a method for producing free-standing, isolated nanostructures of any shape using soft or imprint lithography techniques.

La présente invention a trait à l'utilisation de matériaux à base d'élastomère fluoré, notamment des matériaux à base de polyéther perfluoré, dans des applications lithographiques molle ou d'impression haute résolution, telles que le moulage de répliques à l'échelle micronique ou nanométrique, et le moulage par premier contact à l'échelle nanométrique de matériaux organiques pour la génération d'éléments de haute fidélité au moyen d'un moule élastomérique. Par conséquent, la présente invention a trait à un procédé pour la production de nanostructures isolées autoportantes de toute forme au moyen de techniques de lithographie molle ou d'impression.

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