Methods for high t _superconductor film deposition

Details Methods for high t _superconductor film deposition Methods for high t _superconductor film deposition

H - Electricity

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H01L 39/24 (2006.01) B05D 3/02 (2006.01) B05D 3/06 (2006.01) B05D 5/12 (2006.01)

Patent

CA 1313087

METHODS FOR HIGH Tc SUPERCONDUCTOR FILM DEPOSITION ABSTRACT OF THE DISCLOSURE The present invention describes two simple methods to prepare high Tc multi element superconductor films. In the first method, metallic elements (or oxides) are deposited sequentially on substrates in a vacuum system. The film composition is controlled by controlling the amounts of the source materials introduced into the boats. In addition, one or more of the elements (or oxides) are-introduced to the films by treating the films in an environment containing such elements. The other method described involves the deposition of films on substrates with arbitrary shape using a non vacuum paint on method.

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