Methods of fabricating interferometric modulators by...

Details Methods of fabricating interferometric modulators by... Methods of fabricating interferometric modulators by...

G - Physics

02

F

G02F 1/01 (2006.01) B81B 7/02 (2006.01) G02B 26/00 (2006.01) G02B 26/08 (2006.01)

Patent

CA 2520374

Methods for making MEMS devices such as interferometric modulators involve selectively removing a sacrificial portion of a material to form an internal cavity, leaving behind a remaining portion of the material to form a post structure. The material may be blanket deposited and selectively altered to define sacrificial portions that are selectively removable relative to the remaining portions. Alternatively, a material layer can be laterally recessed away from openings in a covering layer. These methods may be used to make unreleased and released interferometric modulators.

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