C - Chemistry – Metallurgy – 23 – C
Patent
C - Chemistry, Metallurgy
23
C
C23C 16/00 (2006.01) A61F 2/06 (2006.01)
Patent
CA 2622273
A method of depositing shape memory or superelastic thin films by chemical vapor deposition (CVD) and medical devices made thereby, including stents, grafts, stent-grafts, stent covers, occlusive and filter membranes and drug- delivery devices. The method entails a thin film is deposited on a substrate surface using a CVD reaction in the production of a film of nickel-titanium shape memory or superelastic alloy. Such nickel- titanium-based shape memory or superelastic alloys may be binary nickel-titanium alloys or may include additional compounds to form ternary, quaternary, or higher level alloys.
L'invention concerne un procédé de dépôt de films minces à mémoire de forme ou superélastiques par dépôt chimique en phase vapeur (CVD), ainsi que des dispositifs médicaux formés à partir de ces films minces, notamment des stents, des implants, des endoprothèses, des membranes de couverture de stents, de membranes occlusives ou filtrantes, et des dispositifs d'administration de médicaments. Ce procédé consiste à déposer un film mince sur une surface de support au moyen d'une réaction de CVD, pour produire une couche d'alliage nickel-titane à mémoire de forme ou superélastique. Ces alliages à mémoire de forme ou superélastiques à base de nickel-titane peuvent comprendre des composés additionnels pour former des alliages ternaires, quaternaires ou de niveau plus élevé.
Desatnik Nathan
Rosenbaum David G.
Advanced Bio Prosthetic Surfaces Ltd.
Blake Cassels & Graydon Llp
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