Methylene linked aromatic pour point depressant

C - Chemistry – Metallurgy – 07 – C

Patent

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253/127, 44/33,

C07C 25/22 (2006.01) C07C 15/24 (2006.01) C08G 61/02 (2006.01) C10L 1/16 (2006.01) C10L 1/20 (2006.01) C10M 127/06 (2006.01) C10M 131/06 (2006.01) C10M 143/00 (2006.01)

Patent

CA 1272219

ABSTRACT OF THE DISCLOSURE Compositions useful as pour point depressants, novel compounds within such compositions, and processes for making same, as well as lubricant oil compositions containing same, are disclosed. The novel compounds are encompassed by the general structural formula (I) (I) Image wherein the Ar, Ar' and Ar" are independently an aromatic moiety containing 1 to 3 aromatic rings and each aromatic moiety is substituted with 0 to 3 substituents, (R) and (R') are independently an alkylene group containing about 1 to 100 carbon atoms with the proviso that at least one of (R) or (R') is CH2, and n is 0 to about 1000; with the proviso that if n is 0, then (R) is CH2 and each aromatic moiety is independently substituted with 0 to 3 substituents with one aromatic moiety having at least one substituent, the substituents being selected from the group consisting of a substituent derived from an olefin and a substituent derived from a chlorinated hydrocarbon. The composition of the invention includes compounds varying in molecular weight from about 271 to about 300,000.

520316

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