C - Chemistry – Metallurgy – 02 – F
Patent
C - Chemistry, Metallurgy
02
F
C02F 1/32 (2006.01) H01J 61/09 (2006.01)
Patent
CA 2511554
A high pressure gas discharge device and methods of using the device as UV gas discharge light source are disclosed. The device has a cathode covered partially with a dielectric layer which separates the cathode from an anode. A discharge device utilizes one or more microhollows in the uncovered part of the cathode. Methods of utilizing the discharge devise as a gas discharge light source for producing ultapure water.
L'invention concerne un dispositif de microdécharge gazeuse haute pression et des procédés comprenant l'utilisation de ce dispositif en tant que source de lumière UV à décharge gazeuse. Ce dispositif comprend une cathode partiellement recouverte d'une couche diélectrique qui sépare la cathode de l'anode. Le dispositif de décharge fait appel à un ou plusieurs micro-évidements formés dans la partie non recouverte de la cathode. L'invention concerne en outre un procédé consistant à utiliser ce dispositif en tant que source lumineuse à décharge gazeuse pour la production d'eau ultrapure.
Cooper James Randall
Schoenbach Karl H.
Robic
Ultraviolet Sciences Inc.
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