Microfabricated template for multiple charged particle beam...

Details Microfabricated template for multiple charged particle beam... Microfabricated template for multiple charged particle beam...

H - Electricity

01

J

H01J 37/317 (2006.01)

Patent

CA 2336557

A method, an associated structure, and an apparatus for multiple charged particle beam calibration and shielded charged particle lithography. A template defining an array of membranes is positioned above a target (e.g., a semiconductor wafer of the electron beams). Each membrane defines a through slot (opening) and a set of registration marks which are located with respect to registration marks of the other membranes. Patterns are written onto the target by scanning each electron beam through its associated through slot. Intra- and inter-charged particle beam calibrations for each charged particle beam are carried out using its associated set of registration marks. The template also suppresses undesirable electrical charging of any resist present on the target during the exposure process.

L'invention concerne un procédé, une structure associée, et un appareil de calibration de faisceaux à multiples particules chargées, et de litographie à particules chargées protégées. Un modèle définissant un réseau de membranes est positionné au-dessus d'une cible (par exemple, une plaquette semiconductrice des faisceaux d'électrons). Chaque membrane définit une rainure creuse (ouverture) et un ensemble de motifs d'alignement situés par rapport aux motifs d'alignement des autres membranes. Des motifs sont inscrits sur la cible par balayage de chaque faisceau d'électrons à travers la rainure creuse associée. Des calibrations de faisceaux de particules intra-chargées et inter-chargées pour chaque faisceau de particules chargées sont effectuées à l'aide de l'ensemble de motifs d'alignement associé. Le modèle supprime également le chargement électrique indésirable de toute réserve présente sur la cible pendant le processus d'exposition.

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