Microlithographic apparatus

Details Microlithographic apparatus Microlithographic apparatus

G - Physics

05

F

356/192

G05F 1/00 (2006.01) G03F 7/20 (2006.01) H01L 21/68 (2006.01)

Patent

CA 1304173

ABSTRACT This invention is directed to electro-magnetic alignment apparatus which includes a monolithic stage, a sub-stage, an isolated reference structure, force actuators interposed between the monolithic stage and the sub-stage for suspending and positioning the monolithic stage in space, sensors for sensing the position of the monolithic stage and outputting a signal to control circuitry, which compares the sensed position with a commanded stage position and outputs an error signal to the force actuator, and actuators for controlling the position of the sub-stage to follow the approximate position of the monolithic stage.

599723

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