Microlithographic method for producing thick,...

G - Physics – 03 – F

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96/189

G03F 7/26 (2006.01) G03F 7/09 (2006.01) G11B 5/31 (2006.01) H01F 41/34 (2006.01) H01L 21/027 (2006.01)

Patent

CA 2011927

A microlithographic resist patterning process which allows generation of very thick, vertically- walled resist patterns which allow for subsequent deposition or etching operations can produce high recording density magnetic thin film heads and other devices requiring high aspect ratios.

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