G - Physics – 03 – F
Patent
G - Physics
03
F
96/189
G03F 7/26 (2006.01) G03F 7/09 (2006.01) G11B 5/31 (2006.01) H01F 41/34 (2006.01) H01L 21/027 (2006.01)
Patent
CA 2011927
A microlithographic resist patterning process which allows generation of very thick, vertically- walled resist patterns which allow for subsequent deposition or etching operations can produce high recording density magnetic thin film heads and other devices requiring high aspect ratios.
Fung Susan Kit
Sidman Alan Lee
Quantum Corporation
Smart & Biggar
LandOfFree
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