Microneedle structure and production method therefor

A - Human Necessities – 61 – M

Patent

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A61M 37/00 (2006.01)

Patent

CA 2420859

A method for processing a wafer to form a plurality of hollow microneedles projecing from a substrate includes forming, by use of a dry etching process, a number of groups of recessed features, each including at least one slot deployed to form an open shape having an included area and at least one hole located within the included area. The internal surfaces of the holes and the slots are then coated with a protective layer. An anisotropic wet etching process is then performed in such a manner as to remove material from outside the included areas while leaving a projecting feature within each of the included areas. The protective layer is then removed to reveal the microneedles.

L'invention concerne un procédé de traitement d'une rondelle afin de former plusieurs micro-aiguilles creuses sortant d'un substrat comportant la formation, au moyen d'un procédé de gravure à sec, ainsi que plusieurs groupes de caractéristiques renfoncées, chacun d'eux comprenant au moins une fente déployée permettant de présenter une forme ouverte possédant une zone incluse et au moins un orifice situé à l'intérieur de la zone incluse. Les surfaces internes des orifices et des fentes sont alors revêtues d'une couche protectrice. Un procédé de gravure humide anisotrope permet de retirer le matériau de l'extérieur des zones incluses, tout en laissant une caractéristique de projection dans chacune des zones incluses. La couche protectrice est ensuite retirée afin de révéler des micro-aiguilles.

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