Microwave plasma source

H - Electricity – 05 – H

Patent

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Details

H05H 1/30 (2006.01) G01N 21/68 (2006.01) G01N 21/73 (2006.01) H01J 37/32 (2006.01) H05H 1/24 (2006.01) H05H 1/46 (2006.01)

Patent

CA 2473837

A plasma source for a spectrometer includes a plasma torch (10) located within a waveguide or resonant cavity (40) for both the electric and the magnetic field comoponents of a microwave electromagnetic field to excite a plasma (54). This produces a plasma (54) having a generally elliptical cross section into which sample is relatively easily injected but which still provides good thermal coupling between the plasma and the sample. The invention gives significantly improved limits of detection compared to prior art microwave induced plasma systems. The torch is preferably axially aligned with the direction of the magnetic field component and may be located within a resonant iris (32) within the waveguide or cavity (40).

Selon l'invention, une source de plasma pour spectrom­tre comprend un pistolet ~ plasma (10) plac~ dans un guide d'ondes ou dans une cavit~ r~sonante (40) pour les compos~s du champ ~lectrique et magn~tique d'un champ ~lectromagn~tique ~ micro-ondes de fa×on ~ exciter un plasma (54). Le plasma (54) ainsi obtenu pr~sente une coupe transversale g~n~ralement elliptique dans laquelle un ~chantillon est inject~ de mani­re relativement facile tout en assurant un bon couplage thermique entre le plasma et l'~chantillon. La source de plasma d~crite produit des limites de d~tection sensiblement accrues par rapport aux syst­mes induits par micro-ondes de l'art ant~rieur. Le pistolet est de pr~f~rence axialement align~ dans la direction du compos~ de champ magn~tique et peut Útre situ~ dans une fenÚtre r~sonnante (32) dans la cavit~ du guide d'ondes (40).

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