C - Chemistry – Metallurgy – 30 – B
Patent
C - Chemistry, Metallurgy
30
B
C30B 29/04 (2006.01) C23C 16/27 (2006.01) C23C 16/513 (2006.01)
Patent
CA 2077773
60SD00575 MICROWAVE. RF. AC/DC DISCHARGE ASSISTED FLAME DEPOSITION OF CVD DIAMOND Abstract of the Disclosure Broadly, the present invention is directed to improving a chemical vapor phase deposition (CVD) method for synthesis of diamond wherein a hydrocarbon/hydrogen gaseous mixture is subjected to a combustion flame in the presence of oxygen to at least partially decompose the gaseous mixture to form CVD diamond. The improvement in process comprises subjecting said combustion flame to one or more of dielectric heating, d.c. discharge, or ac. discharge. Dielectric heating can be accomplished by subjecting the combustion flame to microwave (MW) frequency discharge or radiofrequency (RF) discharge. By superimposing dielectric heating or d.c./ac. discharge plasma generation on combustion flame process, the carbon utilization rate of the combustion flame process should improve substantially. As noted above, given the low carbon utilization rate for combustion flame techniques already, small percentage improvements in the carbonutilization rates translate into substantial cost savings in generation of CVD diamond by such combustion flame technique.
Anthony Thomas R.
Fleischer James F.
Company General Electric
Craig Wilson And Company
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