C - Chemistry – Metallurgy – 11 – D
Patent
C - Chemistry, Metallurgy
11
D
C11D 1/83 (2006.01) A61K 8/34 (2006.01) A61K 8/60 (2006.01) A61K 8/85 (2006.01) A61Q 19/10 (2006.01) C11D 3/20 (2006.01) C11D 3/22 (2006.01)
Patent
CA 2176081
The invention relates to a mild cleansing composition with good cleansability, good rinseability and a clean after feeling. The cleaning composition contains a compound bearing at least one hydroxy moiety, a hydrophilic nonionic surfactant, and no more than 55% water. This mild cleansing composition is useful for cleansing cosmetics, as well as a lubricant for the skin for massage.
Kao Brands Company
Ogilvy Renault Llp/s.e.n.c.r.l.,s.r.l.
Sano Tomohiko
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