C - Chemistry – Metallurgy – 11 – D
Patent
C - Chemistry, Metallurgy
11
D
C11D 1/83 (2006.01) C11D 1/94 (2006.01) C11D 3/38 (2006.01) C11D 3/43 (2006.01) C11D 1/29 (2006.01) C11D 1/66 (2006.01) C11D 1/74 (2006.01) C11D 1/75 (2006.01) C11D 1/90 (2006.01)
Patent
CA 2437394
A mild foaming cleanser composition is provided. The cleanser composition has a surfactant system, a moisturizer system, and a solvent system. In addition, the cleanser composition may also include an emulsifier, preservative, pH adjusting agent, fragrance, or many combinations thereof. The total activity of percent solids contributed by the surfactant system is less than 17 percent by weight (wt.%) of the total weight of the composition.
L'invention se rapporte à une composition moussante de nettoyeur doux. Ladite composition moussante présente un système tensio-actif, un système hydratant et un système solvant. Ladite composition peut, en outre, renfermer un émulsifiant, un conservateur, un agent de réglage du pH, une fragrance ou toute autre combinaison. L'activité ou le pourcentage total(e) de solides du système tensio-actif est inférieur(e) à 17 % en poids du poids total de la composition.
Garcia Luz M.
Piterski Catherine A.
Gierczak Eugene J. A.
Playtex Products Inc.
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