Mild personal cleansing bar composition with balanced...

C - Chemistry – Metallurgy – 11 – D

Patent

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Details

C11D 10/04 (2006.01) C11D 3/18 (2006.01) C11D 3/22 (2006.01) C11D 3/37 (2006.01) C11D 17/00 (2006.01) C11D 1/10 (2006.01) C11D 1/12 (2006.01) C11D 1/14 (2006.01) C11D 1/16 (2006.01) A61K 7/48 (1995.01)

Patent

CA 2116665

This invention is an improved mild personal cleansing syndet bar comprising: long chain synthetic surfactant having essentially saturated C15-C22, preferably C16-C18, alkyl or acyl chains, more preferably cetearyl sulfate; a high lathering, mild synthetic surfactant, preferably C12-C14 acyl isethionate; soap; fatty acids; sodium isethionate; paraffin wax, preferably a high melting point paraffin wax, and optionally, but preferably, cationic polymer. The bar has improved processability, good smear and in-use properties as well as improved mildness and rinsability without meaningful lather negatives.

L'invention concerne un pain nettoyant synthétique, doux et amélioré, pour l'hygiène personnelle comprenant : un surfactant synthétique à longue chaîne ayant de 15 à 22 C essentiellement saturés, de préférence des chaînes alkylées ou acylées de 16-18 C et encore mieux un sulfate de cétéaryle; un surfactant synthétique doux très moussant, de préférence un iséthionate d'acyle de 12-14 C; un savon; des acides gras; de l'iséthionate de sodium; de la paraffine, ayant de préférence un point de fusion élevé et, facultativement, mais préférablement, un polymère cationique. Le pain se prête mieux à la transformation, s'étale bien et a des propriétés d'utilisation améliorées. Il est plus doux, se rince plus facilement et ne laisse pas de résidus significatifs de mousse.

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