Mipc column cleaning system and process

Details Mipc column cleaning system and process Mipc column cleaning system and process

B - Operations, Transporting

01

D

B01D 15/08 (2006.01) B01D 15/16 (2006.01) B01D 15/20 (2006.01) B01D 15/36 (2006.01) G01N 30/34 (2006.01) G01N 30/02 (2006.01)

Patent

CA 2406665

An apparatus for effecting base pair length separations of DNA fragments by matched ion paired chromatography comprising a separation column containing separation media having non-polar DNA separation surfaces, separation solution supply means, and a separation solution conduit communicating with the separation column and the separation solution supply means, and a cleaning solution valve means positioned in the separation solution conduit for injecting cleaning solution into the separation solution conduit. A process for cleaning the non-polar DNA separation surfaces in the apparatus comprising interrupting the flow of separation solvent with a block of cleaning solution injected into the flow of separation solution passing to the column, the cleaning solution containing agent which removes accumulated residues from the non-polar surface. The cleaning solution can have an alkaline pH and contain a chelating agent such as EDTA.

L'invention concerne un appareil permettant d'effectuer des séparations de longueur de paires de bases de fragments d'ADN par chromatographie à paires d'ions appariés, comprenant une colonne de séparation dotée d'un milieu de séparation à surfaces de séparation d'ADN non polaires, un dispositif de distribution de solution de séparation et un conduit de solution de séparation en communication avec ladite colonne et ledit dispositif. Une soupape de solution de lavage est, par ailleurs, placée dans le conduit de solution de séparation afin d'injecter la solution de lavage dans ledit conduit. L'invention concerne également un procédé de lavage des surfaces non polaires de séparation d'ADN dans l'appareil, qui consiste à interrompre le débit du solvant de séparation au moyen d'un bloc de solution de lavage injecté dans le débit de la solution de séparation transmis à la colonne, l'agent contenant la solution de lavage éliminant les résidus accumulés de la surface non polaire. La solution de lavage peut posséder un pH alcalin et contenir un agent de chélation, tel que l'EDTA.

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