Mixing gases

G - Physics – 05 – D

Patent

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G05D 11/00 (2006.01) B01F 3/02 (2006.01) G05D 11/13 (2006.01) G05D 27/00 (2006.01)

Patent

CA 1119810

ABSTRACT MIXING GASES A gas mixing apparatus comprises for each gas a pressure reducing valve 1, a feed pipe 2, an electromagnetic valve V and a pre-set metering valve 4 for supplying the gas to a mixing chamber 5. The valves V are operated by a control system 6 responsive to a monitor 7 of the gas pressure in the chamber 5. Gas is supplied from the chamber 5 through a valve 9 to a gas consumer. When the pressure in the chamber falls below a predetermined value, the gas is supplied to the chamber by opening and closing the valves V at times which are symmetrically disposed relative to each other during a timing cycle, the opening times of the indiv- idual valves V being selected in accordance with the desired volumetric percentage of the associated gas in the resulting mixture and at least one cycle being performed each time the gas falls below the predetermined value. The apparatus is suitable for supplying gas to plants where workpieces under- go plasma discharge treatment.

350129

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