C - Chemistry – Metallurgy – 07 – C
Patent
C - Chemistry, Metallurgy
07
C
C07C 7/167 (2006.01) C07C 2/04 (2006.01) C07C 5/08 (2006.01)
Patent
CA 2568961
To provide a C4 fraction that contains significantly reduced amounts of butynes and methylallene and to provide a process for low-cost and effective production of ethers in which the C4 fraction is used as the starting material for a telomerization process. A mixture containing 25 to 80 mass% 1,3-butadiene, 13 to 68 mass% butenes and 2 to 15 mass% butanes with butynes and methylallene being contained in amounts of 50 ppm or less and to 800 ppm, respectively
Iwasaki Hideharu
Tokuyasu Jin
Kirby Eades Gale Baker
Kuraray Co. Ltd.
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