Modified phenolic resins

Details Modified phenolic resins Modified phenolic resins

C - Chemistry, Metallurgy

08

G

402/42

C08G 8/28 (2006.01) C09D 5/44 (2006.01) G03F 7/00 (2006.01) G03F 7/023 (2006.01)

Patent

CA 1244587

ABSTRACT MODIFIED PHENOLIC RESINS An electrodepositable photosensitive modified phenolic novolak resin of general formula Image where Ar1 represents a divalent aromatic group linked through aromatic carbon atoms to the indicated groups -OR2 and -CH(R1)? Ar2 represents a trivalent aromatic group linked through aromatic carbon atoms to the indicated groups -OR2 and -CH(R1)? R1 represents a hydrogen atom or an alkyl, aryl or carboxyl group, R2 represents a hydrogen atom, an alkyl group which may be substituted by a hydroxyl or alkoxy group, or a group of formula -CO-R3-COOH, -SO2R4, -COR5 or -SO2h least 1% of the groups R2 representing a group -CO-R3-COOH and at least 4% of the groups R2 representing a group -SO2R4, R3 denotes a divalent aliphatic, cycloaliphatic, aromatic or araliphatic group, R4 denotes a 1,2-benzoquinone diazide group or 1,2- naphthoquinone diazide group R5 denotes a carboxyl-free monovalent group, and n denotes zero or an integer of 1 to 20. The resins are useful in printed circuit manufacture.

502931

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