C - Chemistry – Metallurgy – 08 – J
Patent
C - Chemistry, Metallurgy
08
J
18/24
C08J 9/28 (2006.01) C08G 65/48 (2006.01) C08G 75/20 (2006.01) C08J 5/22 (2006.01)
Patent
CA 1171614
1-13325/ALI 9/+ Abstract of the Disclosure Modified polysulfones containing semipermeable membranes, process for their manufacture and their use. Semipermeable membranes of modified polysulfones are provided which comprises repeating units of the formula Image wherein Ml and M2 are independently a valence bond, -O- or -NH-, R is a valence bond or a group of the formula Image Image with the proviso that if Rl is a valence bond, only one of Ml and M2 can be -O-, R2 and R3 are independently a group of the formula Image or Image the aryl radicals Rl, R2 and R3 are optionally further substituted, R4 is a valence bond, -O-, alkylene of 1 to 4 carbon atoms optionally substituted or interrupted by cycloalkyl(ene) or aryl(ene) of at most 7 carbon atoms, or alkylidene of 2 to 4 carbon atoms, R5 to R10 are independently hydrogen, or -R11NH2, Image NH or -R13OH radicals, these radicals being modified through chemical reaction with . .. . (a) a monomeric compound containing at least two functional groups, (b) a polyfunctional, linear or branched oligomer or polymer, and (c) a non-ionic or ionic compound containing at least one, preferably two groups capable of reaction with (b), -R12X or -R13CHO radicals, modified through chemical reaction with (b) and (c), or -R13CN radicals, modified through chemical reaction with hydroxyl- amine, (a), (b) and (c), R11 is a valence bond, -CH2-, alkylene or arylene containing oxygen or nitrogen atoms, R11 constitutes the atoms necessary to form a heterocyclic ring condensed with the polymer backbone and X is halogen, the degree of substitution of substituents R5 to R10 - different from hydrogen - being between 0.3-and 3 milliequivalents/g. The new membranes are suitable in reverse osmosis and ultrafiltration processes. They show good permeability (flux) and objection characteristics combined with solvent and compaction resistance.
398452
Aviv Gershon
Kotraro Reuven
Linder Charles
Perry Mordechai
Aligena Ag
Gowling Lafleur Henderson Llp
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