Modified substrate and process for production thereof

C - Chemistry – Metallurgy – 08 – J

Patent

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Details

C08J 7/00 (2006.01) A61L 31/00 (2006.01) A61L 33/00 (2006.01) A61M 1/18 (2006.01) B01D 65/02 (2006.01) B01D 69/08 (2006.01) B01D 71/40 (2006.01) D06M 10/00 (2006.01) D06M 13/144 (2006.01)

Patent

CA 2602805

Disclosed is a modified substrate which is characterized by comprising, as the constitutional component, a polymer having an ester group in the main chain or a side chain and also having a hydrophobic group. Particularly, a polymer having an ester group in the main chain or a side chain is irradiated with a radioactive ray while allowing the polymer to contact with an aqueous solution of a monohydric alcohol or a dihydric or higher alcohol having at least one carbon atom between the carbon atoms to which hydroxyl groups are attached with respect to a monomer unit or a polymer unit made of the monomer unit, whereby a hydrophobic group can be introduced into the polymer.

L~invention décrit un substrat modifié qui est caractérisé en ce qu~il comprend, en tant que composant constitutionnel, un polymère comportant un groupe ester dans la chaîne principale ou une chaîne latérale et comportant également un groupe hydrophobe. En particulier, on soumet un polymère comportant un groupe ester dans la chaîne principale ou une chaîne latérale à une irradiation par un rayonnement radioactif, tout en plaçant le polymère en contact avec une solution aqueuse d~un alcool monohydrique, dihydrique ou supérieur ayant au moins un atome de carbone entre les atomes de carbone portant les groupes hydroxyle, par rapport à un motif monomère ou un motif polymère constitué du motif monomère, par quoi on peut ainsi introduire un groupe hydrophobe dans le polymère.

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