Modular continuous vapor deposition system

Details Modular continuous vapor deposition system Modular continuous vapor deposition system

C - Chemistry, Metallurgy

23

C

204/167.1

C23C 14/54 (2006.01) C23C 14/56 (2006.01) C23C 16/54 (2006.01) C30B 25/16 (2006.01) H01L 21/00 (2006.01)

Patent

CA 2009369

A MODULAR CONTINUOUS VAPOR DEPOSITION SYSTEM ABSTRACT A modular continuous vapor deposition system for the fabrication of semiconductor devices having a plurality of deposition modules isolated from each other by isolation modules which prevent the cross contamina- tion of the different processing gases used in the deposition modules. Each of the deposition modules has a flow of a decomposable processing gas therethrough at a desired pressure, and means for generating a continu- ous glow discharge. The glow discharge decomposes the processing gas to deposit a layer of amorphous semicon- ductor material on the discrete substrate sheets as they are transported through each of the deposition modules. A plurality of gate valves effectively seal the inter- faces between adjacent modules to isolate them from their immediate neighbors and are opened in a predeter- mined sequence to allow the substrate sheets to be transported from one module to the next. The isolation modules are connected to a vacuum source and a back-fill gas source. A control coordinates the activation of the gate valves, the vacuum source and the back-fill gas source so that the substrate sheets can be uninterrupt- edly transported through the system while maintaining the glow discharge continuous and gas pressure in each deposition module at the desired pressure.

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