Molecular resist compositions, methods of patterning...

Details Molecular resist compositions, methods of patterning... Molecular resist compositions, methods of patterning...

G - Physics

03

F

G03F 7/00 (2006.01)

Patent

CA 2723681

The present invention is directed to molecular resist compositions comprising an organic amine, methods of forming features on substrates using the molecular resists compositions and process products prepared therefrom.

La présente invention porte sur des compositions de réserve moléculaire qui comportent une amine organique, sur des procédés de création de caractéristiques sur des substrats à l'aide des compositions de réserve moléculaire et sur des produits obtenus à partir de ceux-ci.

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