C - Chemistry – Metallurgy – 07 – C
Patent
C - Chemistry, Metallurgy
07
C
96/150, 204/91.3
C07C 49/84 (2006.01) C08F 2/46 (2006.01)
Patent
CA 1054159
Abstract of the Disclosure Monoacetals of aromatic diketones in which the acetal group is derived from primary mono- or dialkohols are useful as sensitizers in the photochemical polymerisation or photochemical crosslinking of polymers. They are prepared from the diketones (benzils) by reaction with sulfites. The sulfites and the benzils may be formed immediately before the reaction in the same vessel without isolating these compounds. Most of the benzil monoacetals are new compounds.
176687
Brunisholz Jean
Kirchmayr Rudolf
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