C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
C07D 211/46 (2006.01) C08K 5/3432 (2006.01) C08K 5/3435 (2006.01) C08L 101/00 (2006.01)
Patent
CA 2078528
Disclosed are monomeric hindered amine esters of monocarboxylic resin acids of the formula: Image (wherein R is a saturated or unsaturated carboxylic acid residue, such as a resin acid residue, R1, R2, R3 and R4 are each a C1-8 alkyl group,: and R5 is hydrogen or a C1-8 alkyl group) which are useful as stabilizers for olefin polymers.
Fetherstonhaugh & Co.
Montell North America Inc.
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