C - Chemistry – Metallurgy – 23 – C
Patent
C - Chemistry, Metallurgy
23
C
C23C 14/34 (2006.01) B23P 6/00 (2006.01) C23C 4/06 (2006.01) C23C 14/32 (2006.01) C23C 14/56 (2006.01) F01D 5/00 (2006.01) F01D 5/28 (2006.01)
Patent
CA 2500933
Ion-enhanced physical vapor deposition is augmented by sputtering to deposit multi-component materials. The process may be used to deposit coatings and repair material on Ti alloy turbine engine parts. The physical vapor deposition may be ion- enhanced electron beam physical vapor deposition.
Belousov Igor V.
Biber Vladimir
Kuzmichev Anatoly I.
Memmen Robert L.
Norton Rose Or S.e.n.c.r.l. S.r.l./llp
United Technologies Corporation
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