Multi-layer resist

Details Multi-layer resist Multi-layer resist

G - Physics

03

F

117/125, 96/266

G03F 7/11 (2006.01) G03F 7/09 (2006.01) G03F 7/36 (2006.01)

Patent

CA 2010169

Abstract of the Disclosure A multi-layer resist comprising (A) a layer of a Langmuir-Blodgett film, (B) a layer of at least one thin film and (C) a substrate, said layer (B) being placed between said layer (A) and said substrate (C). The multi-layer resists of the invention are applicable to ultra fine processing on the order of submicron, half- micron or quater-micron, and the number of defects can be remarkably decreased.

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