Multilayer dry-film nagative-acting photoresist

Details Multilayer dry-film nagative-acting photoresist Multilayer dry-film nagative-acting photoresist

G - Physics

03

F

96/1

G03F 7/09 (2006.01) H05K 3/00 (2006.01) H05K 3/18 (2006.01)

Patent

CA 1242916

Abstract Dry-film, negative-acting photoresist layers are used in the formation of many articles such as circuit boards, printing plates and the like. Laminable monolayers of photoresist can suffer from slow speeds, brittleness, variable adhesive characteristics, and narrow processing latitude during development and exposure. The use of a crosslinked or crosslinkable integral thermoplastic adhesive layer on the dry-film, negative-acting photoresist layer improves the properties and performance of the photoresist.

433931

Affiliated with

Also associated with

Rating

Multilayer dry-film nagative-acting photoresist does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Multilayer dry-film nagative-acting photoresist, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Multilayer dry-film nagative-acting photoresist will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFCA-PAI-O-1225124