Multilayer dry-film positive-acting photoresist

Details Multilayer dry-film positive-acting photoresist Multilayer dry-film positive-acting photoresist

G - Physics

03

F

96/1

G03F 7/09 (2006.01) H05K 3/00 (2006.01) H05K 3/18 (2006.01)

Patent

CA 1242917

Abstract Dry-film, positive-acting photoresist layers are used in the formation of many articles such as circuit boards, printing plates and the like. Laminable monolayers of photoresist suffer from slow speeds, brittleness, and narrow latitude during development and exposure. The use of a thermoplastic, crosslinked or crosslinkable integral adhesive layer on the dry-film, positive-acting photoresist layer improves the properties and performance of the photoresist.

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