Multilayer interconnect system, and method of making

H - Electricity – 05 – K

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

356/10

H05K 7/20 (2006.01) H01L 21/98 (2006.01) H01L 23/538 (2006.01) H01L 25/065 (2006.01)

Patent

CA 1073557

A MULTILAYER INTERCONNECT SYSTEM, AND METHOD OF MAKING ABSTRACT OF THE DISCLOSURE A large scale integrated circuit multilayer interconnect system in which signal propagation delay is substantially reduced by using air as the dielectric between layers, rather than an in- sulating material. The system is comprised of a plurality of two basic layers, namely a signal plane layer and a reference plane layer. The basic layers are spaced from and alternated with one another by insulated spacers to maintain a desired air gap.

279129

LandOfFree

Say what you really think

Search LandOfFree.com for Canadian inventors and patents. Rate them and share your experience with other people.

Rating

Multilayer interconnect system, and method of making does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Multilayer interconnect system, and method of making, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Multilayer interconnect system, and method of making will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFCA-PAI-O-528596

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.