Multilayer microstructures and laser based method for...

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B23K 26/36 (2006.01) B81C 1/00 (2006.01) H01L 21/268 (2006.01) H01L 51/40 (2006.01) H01L 51/30 (2006.01) H01L 51/52 (2006.01) H01L 51/56 (2006.01)

Patent

CA 2381643

Many integrated circuits require a multilayer structure which contains layer of an organic or polymeric material with a patterned metallic layer on it. Laser patterning has many favourable characteristics but it also damages the organic or polymeric material. A novel method is disclosed that makes possible laser patterning of conductive metal electrode deposited on top of an organic and/or polymeric material without significant ablation of the organic and/or polymeric material. The method can achieve higher patterning resolution, resulting in higher quality integrated circuits. The method is based on the application of a thin coating of an inexpensive anti-reflector deposited on top of the desired metal electrode which in turn lies on the organic and/or polymeric material. The thin anti-reflecting coating allows the use of a lower fluence laser for ablation of metal layer without damaging the underlying organic and/or polymeric material.

De nombreux circuits intégrés nécessitent une structure multicouche comprenant une couche de matériau organique ou de polymère recouverte d'une couche métallique comportant des motifs. La formation de motifs au laser comporte de nombreuses caractéristiques intéressantes, mais elle endommage le matériau organique ou le polymère. Un nouveau procédé rend possible la formation de motifs au laser sur une électrode métallique conductrice déposée sur un matériau organique ou un polymère sans entamer de façon importante le matériau ou le polymère. Le procédé permet de réaliser des motifs à résolution élevée, ce qui donne des circuits intégrés de meilleure qualité. Le procédé repose sur l'application d'un mince revêtement antireflet peu coûteux sur l'électrode métallique, elle-même posée sur le matériau organique et/ou le polymère. Le mince revêtement antireflet permet d'utiliser un laser à faible fluence pour l'ablation de la couche métallique sans endommager le matériau organique et/ou le polymère sous-jacent.

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