Multilayer mirror with maximum reflectance

Details Multilayer mirror with maximum reflectance Multilayer mirror with maximum reflectance

G - Physics

02

B

88/113

G02B 5/08 (2006.01) G02B 1/10 (2006.01)

Patent

CA 1139596

Abstract of the Disclosure A high reflectance mirror utilizing a dielectric stack having multiple layers of low and high retractive index material at least one of which is absorbing at the design wavelength. At least one pair of layers is formed on a substructure with the thickness of the individual layers being both different from a quarterwave optical thickness and preselected to maximize the reflectance of the mirror. Mirrors in which both dielectric materials in the stack have different absorptances at the design wavelength are dis- closed with the layer thicknesses of one or more optimum pairs formed on a substructure being different from a quarterwave optical thickness such that the layers of higher absorptance material are less than a quarterwave optical thickness and the layers of lower absorptance material are more than a quarterwave optical thickness. The individual thicknesses of the layers are optimized to provide maximum reflectance, leading to a nonperiodic stack when a sub- stantial number of such optimum pairs of layers are uti- lized.

361489

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