Multilayer sample processing devices and methods

Details Multilayer sample processing devices and methods Multilayer sample processing devices and methods

B - Operations, Transporting

01

L

B01L 3/00 (2006.01) B01J 19/00 (2006.01)

Patent

CA 2541900

Sample processing devices that include transmissive layers and control layers to reduce or eliminate cross-talk between process chambers in the processing device are disclosed. The transmissive layers may transmit significant portions of signal light and/or interrogation light while the control layers block significant portions of signal light and/or interrogation light. Methods of manufacturing processing devices that include transmissive layers and control layers are also disclosed. The methods may involve continuous forming processes including co-extrusion of materials to form the transmissive layer and control layer in a processing device, followed by formation of the process chambers in the control layer. Alternatively, the methods may involve extrusion of materials for the control layer, followed by formation of process chambers in the control layer.

L'invention concerne des dispositifs de traitement d'échantillon comprenant des couches d'émission et des couches de commande permettant de réduire ou d'éliminer les interférences entre les chambres de traitement du dispositif de traitement. Les couches d'émission peuvent émettre des parties importantes de lumière de signal et/ou de lumière d'interrogation, alors que les couches de commande bloquent des parties importantes de lumière de signal et/ou de lumière d'interrogation. L'invention concerne également des procédés de fabrication de dispositifs de traitement comprenant des couches d'émission et des couches de commande. Ces procédés peuvent comprendre des processus de formation continus, notamment la co-extrusion de matériaux, destinés à former la couche d'émission et la couche de commande du dispositif de traitement, suivis par la formation des chambres de traitement dans la couche de commande. En variante, ces procédés peuvent comprendre l'extrusion de matériaux pour la couche de commande, suivie par la formation des chambres de traitement dans la couche de commande.

Affiliated with

Also associated with

Rating

Multilayer sample processing devices and methods does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Multilayer sample processing devices and methods, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Multilayer sample processing devices and methods will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFCA-PAI-O-1589406