Multilayer structure

Details Multilayer structure Multilayer structure

B - Operations, Transporting

32

B

B32B 27/34 (2006.01) B32B 1/08 (2006.01) B65D 1/09 (2006.01) F16L 11/04 (2006.01)

Patent

CA 2564759

Disclosed is a multilayer structure which is composed of two or more layers including at least a layer (a) composed of an aliphatic polyamide (A) and a layer (b) composed of a semi-aromatic polyamide (B) comprising diamine units containing not less than 60 mol% of aliphatic diamine units having 9-13 carbon atoms relative to the total diamine units and dicarboxylic acid units containing not less than 50 mol% of terephthalic acid units and/or naphthalene dicarboxylic acid units relative to the total dicarboxylic acid units. The layer (b) is arranged as the innermost layer. This multilayer structure is excellent in heat resistance, chemical resistance, chemical and/or gas permeation barrier properties, dissolution resistance of monomers/oligomers, interlayer adhesion and durability.

Ici est divulgué une structure multicouche, qui est composée de deux couches ou plus comprenant au moins une couche (a) composée d~un polyamide aliphatique (A) et une couche (B) composée d~un polyamide semi-aromatique (B) comprenant des unités de diamine contenant pas moins de 60 %mol d~unités de diamine aliphatique comportant de 9 à 13 atomes de carbone relativement au total des unités de diamine et d~unités d~acide dicarboxylique contenant pas moins de 50% mol d~unités d~acide téréphtalique et/ou d~unités d~acide dicarboxylique de naphtalène relativement aux unités d~acide dicarboxylique totales. La couche (b) est disposée dans la couche la plus à l~intérieur. La structure multicouche est excellente pour la résistance à la chaleur, aux produits chimiques et aux propriétés de barrière de perméation contre les gaz, la résistance de dissolution des monomères/oligomères, l~adhésion de couche de liaison intercouche et la durabilité.

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