Multiple beam laser sintering

B - Operations – Transporting – 22 – F

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Details

B22F 3/105 (2006.01) B29C 67/00 (2006.01)

Patent

CA 2174635

A multiple beam laser sintering device includes a sintering beam (64) having a focal point at a powder bed (68) and at least one defocussed laser beam (116) incident on a region near the focal point of the focussed beam (64). The sintering beam (64) raises the temperature of the powder (84) to the sintering temperature. The defocussed beam (116) raises the temperature of the material surrounding the sintering beam (64) to a level below the sintering temperature, thereby reducing the temperature gradient between the sintering location and the surrounding material. Thermal radiation may be measured from one or both beams and used to control the power of one or both beams and the power of one or both beams may be controlled to maintain the temperature at a desired level. Alternatively, a plurality of defocussed beams may be used to provide either a plurality of thermal gradient steps, or to control the temperature of each region around the sintering point independently.

Un dispositif de frittage par faisceau laser multiple comporte un faisceau de frittage (64) dont le foyer est situé dans un lit (68) de poudre et au moins un faisceau laser défocalisé (116) aboutissant sur une région voisine du foyer du faisceau focalisé (64). Le faisceau de frittage (64) augmente la température de la poudre (84) à la température de frittage. Le faisceau défocalisé (116) augmente la température du matériau entourant le faisceau de frittage (64) à un niveau en dessous de la température de frittage, diminuant ainsi le gradient de température entre l'emplacemnt de frittage et le matériau environnant. On peut mesurer les radiations thermiques d'un ou des deux faisceaux pour régler la puissance du ou des faisceaux, afin de maintenir la température au niveau souhaité. On peut dans une variante utiliser une pluralité de faisceaux défocalisés pour fournir soit une pluralité de gradients thermiques, soit pour régler séparément la température de chaque région autour du point de frittage.

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