Multiple electron beam exposure system

Details Multiple electron beam exposure system Multiple electron beam exposure system

H - Electricity

01

J

356/192

H01J 37/00 (2006.01) H01J 37/30 (2006.01) H01J 37/302 (2006.01)

Patent

CA 1100237

MULTIPLE ELECTRON BEAM EXPOSURE SYSTEM Abstract of the Disclosure In an improved electron beam exposure system (EBES), a demagnified image of an array of illuminated apertures is focused and scanned over the surface of a resist-coated workpiece. A deflection unit is associated with the array of apertures to provide an independent blanking capability for each of the electron beams propagated through the aperture array. Such an EBES can be operated in a faster mode than a conventional system. In addition, the electron dose delivered to each address position on the resist coating can be thereby selectively controlled.

297440

Affiliated with

Also associated with

Rating

Multiple electron beam exposure system does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Multiple electron beam exposure system, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Multiple electron beam exposure system will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFCA-PAI-O-756166