G - Physics – 01 – J
Patent
G - Physics
01
J
340/155, 73/53
G01J 3/00 (2006.01) G01J 1/42 (2006.01) G03B 27/72 (2006.01) G03F 7/20 (2006.01) H05B 41/392 (2006.01)
Patent
CA 1134644
ABSTRACT A multispectrum light detection system for controlling exposure time of a photoresist coated substrate in a projection aligner- printer machine wherein the relatively narrow spectral responsivity characteristics of a selected photoresist is matched to the wider spectrum inherent in the output flux of a combined light source and optical system. A representative sample of the system's wide spectrum output flux is divided into three or more narrower spectral bands each of which is measured by its own detector that provides an electrical signal proportional to the radiant flux intensity within that band. The resultant electrical signals from the separate spectral bands are weighted and combined in a summing amplifier to form a composite exposure control signal. Means are provided to adjust the contribution of each electrical signal to the combined control signal in accordance with known spectral response characteristics of the photoresist.
354257
Osler Hoskin & Harcourt Llp
Perkin-Elmer Corporation The
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