C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
260/277.3
C07D 221/14 (2006.01) C07D 401/06 (2006.01)
Patent
CA 1070311
ABSTRACT Compounds of the following formula and their acid addition salts Image wherein R1 and R2 are independently selected from hydrogen, halogen, lower alkyl, lower alkoxy, lower alkylthio, nitro, cyano, amino and trifluoromethyl; A is a straight or branched chain alkylene of 1 to 8 carbons; R3 is phenyl or substituted phenyl; and R is lower alkyl or cycloalkyl of 3 to 7 carbons are disclosed. These compounds exhibit antidepressant activity. In addition these compounds are useful as antiinflammatory agents.
241199
Vogt B. Richard
Wade Peter C.
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