C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
260/325, 260/336
C07D 211/96 (2006.01) C07D 207/48 (2006.01) C07D 217/20 (2006.01) C07D 281/10 (2006.01)
Patent
CA 1228853
- 1 - Abstract: The invention provides a naphthalene derivative of the formula: Image wherein R1 is hydrogen and R2 is lower alkyl or phenyl- lower alkyl; or R1 and R2 are combined together to form lower alkylene; X is halogen; and the absolute configura- tion at the asymmetric carbon atom shown by the asterisk is either the (S)- or (R)-configuration, and a method for the preparation thereof. The naphthalene derivative is useful as a chiral reagent for determining the optical purity of an optically active compound containing at least one functional group selected from hydroxy, amino and imino groups.
439465
Ishii Kazuhiro
Matsumoto Mikio
Matsuo Masaaki
Tsumagari Nobuchika
Wada Hiroshi
Kirby Eades Gale Baker
Tanabe Seiyaku Co. Ltd.
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