C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
167/210, 167/223
C07D 295/192 (2006.01) A61K 31/495 (2006.01) A61K 31/55 (2006.01) C07D 213/56 (2006.01) C07D 243/08 (2006.01) C07D 295/185 (2006.01) C07D 295/194 (2006.01) C07D 295/26 (2006.01) C07D 317/60 (2006.01) C07D 333/24 (2006.01) C07D 409/14 (2006.01)
Patent
CA 2015678
ABSTRACT OF THE DISCLOSURE Compounds of formula (I): Image ( I ) [in which R1 and R2 is each -R5, -CH=CH-R5 or -C?C-R5, in which R5 is optionally substituted aryl or aromatic heterocyclic; R3 is hydrogen, alkyl, cyano or -R5; X is oxygen or sulfur; A is 1,4-piperazin-1,4- diyl or a 1,4-homopiperazin-1,4-diyl; B is alkylene, carbonyl, thiocarbonyl, sulfinyl or sulfonyl; and R4 is optionally substituted phenyl] and pharmaceutically acceptable salts thereof have valuable PAF antagonist activity, and may be prepared by reacting a compound containing the piperazine or homopiperazine part of the molecule with a compound containing the other part of the molecule.
Iijima Yasuteru
Miyamoto Masaaki
Nakamura Norio
Ohkawa Nobuyuki
Oshima Takeshi
Marks & Clerk
Sankyo Company Limited
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