C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
C07D 405/10 (2006.01) A61K 31/195 (2006.01) A61K 31/215 (2006.01) A61K 31/33 (2006.01) A61K 31/66 (2006.01) C07C 233/47 (2006.01) C07D 209/30 (2006.01) C07D 215/12 (2006.01) C07D 217/14 (2006.01) C07D 257/04 (2006.01) C07D 307/82 (2006.01) C07D 333/60 (2006.01) C07D 333/62 (2006.01) C07D 401/10 (2006.01) C07D 409/10 (2006.01)
Patent
CA 2076057
4-18757/A N-Acyl-N-heterocyclylalkylamino acids, processes, compositions and use Abstract The invention relates to N-acyl-N-heterocyclylalkylamino acids of the formula Image (I), wherein R1 is C1-C7alkyl that is unsubstituted or substituted by halogen or by hydroxy, or is C2-C7- alkenyl, C3-C7cycloalkyl, C3-C7cycloalkoxy, C1-C7alkoxy or C3-C7cycloalkyl-C1-C7- alkoxy; R2 is 1H-tetrazol-5-yl, carboxy, C1-C7alkoxycarbonyl, SO3H, PO2H2, PO3H2 or halo- C1-C7alkanesulfonylamino; R3 is 1H-tetrazol-5-yl, hydroxymethyl, C1-C7alkoxymethyl, formyl, carboxy, C1-C7- alkoxycarbonyl, C1-C7alkoxy-C1-C7alkoxycarbonyl, phenyl-C1-C4alkoxycarbonyl or carbamoyl, the amino group of which is unsubstituted or mono-substituted by C1-C7alkyl, C3-C7alkenyl or by phenyl-C1-C7alkyl or di-substituted by C1-C7alkyl, C3-C7alkenyl or by phenyl-C1-C7alkyl independently of one another, or is di-substituted by C2-C7alkylene or by C2-C4alkyleneoxy-C2-C4alkylene; Alk is methylene, ethylene or ethylidene; Het is (i) Image wherein Y1 is O, S or N(R) and R is hydrogen or C1-C7alkyl; or (ii) Image wherein one of the variables Y2 and Y3 is C(R') and the other is N or each of the variables is C(R'); and R' is hydrogen, halogen, C1-C7alkyl, C1-C7alkoxy, C2-C7alkenyloxy, phenoxy, benzyloxy, trifluoromethyl or S(O)m-R, wherein m is 0, 1 or 2; and R ishydrogen or C1-C7alkyl; X1 is -CO- or -S(O)m- and the index m is 0, 1 or 2; one of the variables X2 and X4 is C1-C4alkylene and the other of the variables X2 and X4 is a bond; or each of the variables X2 and X4 is a bond; X3 is C3-C7cycloalkylidene or the structural element -C(Xa)(Xb)- and Xa is hydrogen or C1-C7alkyl and Xb is C1-C7alkyl; and the rings A, B, C and D, with the exception of the substiluents indicated in the formula, and also aromatic substituents are, independently of one another, unsubstituted or mono- or poly-substituted by substituents selected from the group consisting of halogen, C1-C7alkyl, C1-C7aLkoxy, C2-C7alkenyloxy, phenoxy, benzyloxy, trifluoromethyl and S(O)m-R, wherein m is 0, 1 or 2 and R is hydrogen or C1-C7alkyl; and their salts; preparation processes, pharmaceutical compositions comprising acompound of formula I or a pharmaceutically acceptable salt thereof, and use.
Buhlmayer Peter
Schmidlin Tibur
Zbinden Paul
Fetherstonhaugh & Co.
Novartis Ag
LandOfFree
N-acyl-n-heterocyclylalkylamino acids, processes,... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with N-acyl-n-heterocyclylalkylamino acids, processes,..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and N-acyl-n-heterocyclylalkylamino acids, processes,... will most certainly appreciate the feedback.
Profile ID: LFCA-PAI-O-1705796