C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
C07D 451/02 (2006.01) A61K 31/46 (2006.01)
Patent
CA 2060573
This invention relates to compounds of the formula (See formula I) where X is -O-, -S- or -NH-: Y is hydrogen, halogen and loweralkoxy; p is 1 or 2: n is 2, 3 or 4; R is hydrogen, loweralkyl, loweralkoxy, hydroxy, halogen, amino, loweralkylamino, nitro, loweralkylthio, trifluoromethoxy, cyano, trifluoromethyl,(See formula II)alkyl or (See formula III)aryl where aryl is (See formula IV); R1 is hydrogen, loweralkyl, loweralkoxy, halogen, hydroxy, carboxyl, loweralkylamino, nitro, loweralkylthio, cyano, and trifluoromethyl; m is 1 or 2; a pharmaceutically acceptable acid addition salt thereof and, where applicable the geometric and optical isomers and racemic mixtures thereof. The compounds and compositions of this invention are useful as antipsychotic agents and as inhibitors of the reuptake of serotonin.
Fink David M.
Glamkowski Edward J.
Kurys Barbara E.
Aventis Pharmaceuticals Inc.
Bereskin & Parr
Hoechst-Roussel Pharmaceuticals Inc.
LandOfFree
N-(aryloxyalkyl)heteroaryl-8-azabicyclo¬3.2.1|octanes,... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with N-(aryloxyalkyl)heteroaryl-8-azabicyclo¬3.2.1|octanes,..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and N-(aryloxyalkyl)heteroaryl-8-azabicyclo¬3.2.1|octanes,... will most certainly appreciate the feedback.
Profile ID: LFCA-PAI-O-1584057