C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
167/211, 260/266
C07D 401/04 (2006.01) A61K 31/445 (2006.01) A61K 31/495 (2006.01) C07D 231/56 (2006.01) C07D 261/20 (2006.01) C07D 275/04 (2006.01) C07D 403/04 (2006.01) C07D 413/04 (2006.01) C07D 417/04 (2006.01)
Patent
CA 2017193
This invention related to compounds of the formula: (see formula I) wherein X is -p-, -S-, (see formula II), or (see formula III) p is 1 or 2; Y is hydrogen, C1 to C6 alkyl, -OH, Cl, F, Hr, I, C1 to C6 alkoxy, -CF3, -HO2, or -NH2, when p is 1; Y is C1 to C6 alkoxy when p is 2 and X is -O-; R2 is selected from the group consisting of lower alkyl, aryl lower alkyl, aryl, cycloalkyl, aroyl, alkanoyl, and phenyl sulfonyl groups; Z is -CH- or -N-; n is 2, 3, 4, or 5; R is hydrogen, alkyl, C1 - C6-alkoxy, hydroxyl, carboxyl, Cl, F, Br, I, amino, C1 - C6-mono or-dialkyl amino, -NO2, lower alkyl thio, -OCF3, cyano, acylamino, -CF3. trifluoroacetyl, aminocarbonyl, (see formula IV), (see formula V), (see formula VI), (see formula VII), or (see formula VIII); where alkyl is lower alkyl; aryl is phenyl or (see formula IX); R1 is hydrogen, lower alkyl, C1 - C6 alkoxy, hydroxy, Cl, F, Br, I, C1 - C6 alkyl amino, -NO2, -CN, -CF3, -OCF3; and heteroaryl is (see formula X) ; where Q is -O-, -S-, (see formula XI) , -CH=N; R3 is hydrogen, lower alkyl, or acyl; and m is 1, 2, or 3; or a pharmaceutically acceptable acid addition salt thereof. The invention relates further to a process for the preparation o~ the above compounds and their use as medicaments having antipsychotic and/or analgetic activity.
Bordeau Kenneth J.
Chiang Yulin
Helsley Grover Cleveland
Strupczewski Joseph Thomas
Aventis Holdings Inc.
Hoechst-Roussel Pharmaceuticals Inc.
Mckay-Carey & Company
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