C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
167/211, 260/277
C07D 401/12 (2006.01) A61K 31/395 (2006.01) C07D 401/14 (2006.01)
Patent
CA 2016214
- 1 - HOE 89/S 005 ABSTRACT There are described compounds OF the formula Image (I) where -R is Image , Image or Image , -R3 and R4 being independently H, loweralkyl, -CHO, -CH=CH2, -CH=CH-loweralkyl, -CH=CHCO2C2H5, -CH2N(C2H5)2 or - CH2 -N Image ; -R1 when existent is -H, loweralkyl, CH2C3CH,, -2- - CH2C=CCH2 - Image or -CH C=CCH2 Image - R5, R5 being methyl or phenyl optionally mono-substituted with loweralkyl or loweralkoxy; -R2 when existent is loweralkyl or -CH2C-CH; -X is -H, loweralkyl, loweralkoxy, halogen or trifluoromethyl; and the two -Y groups when existent are both -H, or combine to constitute -(CH2) 4-; which compounds are useful as analgesic agents, and for treating various memory dysfunctions characterized by decreased cholinergic function such as Alzheimer's disease.
Davis Larry
Effland Richard C.
Klein Joseph T.
Olsen Gordon E.
Bereskin & Parr
Davis Larry
Effland Richard C.
Hoechst-Roussel Pharmaceuticals Inc.
Klein Joseph T.
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