C - Chemistry – Metallurgy – 07 – C
Patent
C - Chemistry, Metallurgy
07
C
260/550.5
C07C 233/00 (2006.01)
Patent
CA 1186333
ABSTRACT The invention provides a compound of the general formula Image (I), in which R1 represents a lower straight-chain or branched mono- or poly-hydroxyalkyl radical, R2 represents a hydrogen atom, a lower alkyl radical or has the meaning given for R1 in which case R1 and R2 can be the same or different, R3 represents a lower mono- or di-hydroxyalkyl radical, and X represents a direct bond or a straight-chain or branched alkylene radical or a straight-chain or branched alkylene radical which is interrupted by one or more oxygen atoms or which is substituted by one or more of the same or different substituents selected from hydroxy groups and alkoxy radicals, and a process for its preparation. Owing to their good pharmacological and physico- chemical properties, the dimeric compounds of the general formula I are suitable as radio-opaque substances in all the fields of use of water-soluble X-ray contrast media containing iodine. Accordingly, the invention also provides an X-ray contrast preparation containing a compound of the general formula I.
383725
Pfeiffer Heinrich
Speck Ulrich
Marks & Clerk
Schering Aktiengesellschaft
LandOfFree
N-hydroxyalkylated dicarboxylic acid bis-(3,5-... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with N-hydroxyalkylated dicarboxylic acid bis-(3,5-..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and N-hydroxyalkylated dicarboxylic acid bis-(3,5-... will most certainly appreciate the feedback.
Profile ID: LFCA-PAI-O-1173365