C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
C07D 213/56 (2006.01) A61K 31/44 (2006.01) C07D 213/30 (2006.01) C07D 213/42 (2006.01)
Patent
CA 2210905
An N-hydroxyurea derivative or a pharmacologically acceptable salt thereof having the formula (I): (see formula I) wherein, A represents CH, CH-CH2, CH-O, or C=CH, X represents O or S, B represents a C1 to C8 alkylene, C2 to C6 alkenylene, m-phenylene, or p-phenylene, R represents a hydrogen atom, halogen atom, C1 to C4 alkyl which may be substituted with a halogen atom, C1 to C4 alkoxy which may be substituted with a halogen atom, or nitro, R1 represents a hydrogen atom, C1 to C4 lower alkyl, or phenyl, and R2 represents a hydrogen atom, C1 to C4 alkyl, cycloalkyl, phenyl which may be substituted with a substituent, or methanesulfonyl.
L'invention porte sur des dérivés de N-hydroxyurée (ou leurs sels pharmacocompatibles) de formule générale (I) dans laquelle: A représente CH, CH-CH2, CH-O ou C=CH; X représente O ou S; B représente C1-8 alkylène, C2-6 alcénylène, m-phénylène ou p-phénylène; R représente hydrogène, halogéno, C1-4 alkyle facultativement halogéné, C1-4 alkoxy facultativement halogéné ou nitro; R<1> représente hydrogène, C1-4 alkyle inférieur ou phényle; et R<2> représente hydrogène, C1-4 alkyle, cycloalkyle, phényle facultativement substitué ou méthanesulfonyle.
Fujii Tsutomu
Hara Norie
Kawahara Yoshikazu
Komatsu Toshiya
Takano Michika
Borden Ladner Gervais Llp
Nikken Chemicals Co. Ltd.
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