C - Chemistry – Metallurgy – 07 – C
Patent
C - Chemistry, Metallurgy
07
C
260/472.3, 260/5
C07C 65/24 (2006.01) C07C 63/36 (2006.01) C07C 63/72 (2006.01)
Patent
CA 1236480
ABSTRACT compound of formula I Image (I) wherein R1 is hydrogen, lower alkyl, lower alkenyl or phenylmethyl; R2 is hydrogen or lower alkyl; R3 is hydrogen or a substituent at position 4, 5 or 8 of the naphthalene ring, the substituent being selected from the group consisting of lower alkyl, lower alkoxy, halo, cyano, nitro and trihalomethyl, and R4 is hydrogen; or R3 and R4 each is a substituent at different positions selected from positions 3 to 7 of the naphthalene ring, the substituents being selected from the group consisting of lower alkyl, lower alkoxy, halo, trihalomethyl, (lower) alkoxy(lower)alkoxy, phenylmethoxy and phenylmethoxy substituted on the phenyl portion with a lower alkyl, lower alkoxy, halo or trihalomethyl; or a therapeutically acceptable salt with an organic or inorganic base of the compound of formula I wherein R2 is hydrogen. The pre- paration of this compound is also disclosed. Compounds of this type have pharmacology properties which render them beneficial for the treatment of diabetes mellitus and associated conditions. Also disclosed is an amidoester of formula II Image (II) wherein R1, R3, R4 are as defined above and R is lower alkyl. Compound II is useful for the preparation of a compound I. The preparation of compound II is also disclosed.
509682
Abraham Nedumparambil A.
Bellini Francesco
Sestanj Kazimir
Treasurywala Adi
Inc. Ayerst Mckenna & Harrison
Swabey Ogilvy Renault
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