C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
260/363.5
C07D 307/68 (2006.01)
Patent
CA 1254222
ABSTRACT OF THE DISCLOSURE A Compound of the formula: Image Where R is selected from phenyl and phenyl mono or disubtituted with lower alkyl, nitro, halogenated methyl, halogen, lower alkoxy and combinations thereof; Where R1 is selected from hydrogen and lower alkyl; and Where R2 is selected from phenyl; phenyl monosubstituted with lower alkyl, nitro, halogenated methyl, halogen and lower alkoxy; and trans-phenylcyclopropyl in which the phenyl group may be substituted with lower alkyl and halogen. The compounds have antiallergy properties.
531018
Georgiev Vassil S.
Mack Robert A.
Atofina Chemicals Inc.
Borden Ladner Gervais Llp
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